Murakami was established in 1965 as a manufacturer and R&D of screen mask and photo-sensitive materials when electric industry just adapted screen printing technique to produce electric devices. At the same time, we set up the sales division of printing machines and supplies for screen printing.
　　Now, we pour our strength into precision screen mask and photo mask which spread a step further in CAD/CAM design system more substantial as well as our essential task of developing photo-sensitive materials for screen printing.
　　As for CAD/CAM system, our mask centers own the most advanced dealing system of image and equipment like Macintosh, laser photo-plotter, etc in the clean room to pursue finer and sophisticated photo-mask and screen mask.
　　Development of photo-sensitive materials guided the PVA-SBQ, which was researched and developed by DR. Ichimura Kunihiro, former professor of Tokyo Institute of Technology to industrial use products as One Pot Type photo-emulsion and received the 10th “Inoue Harushige Award” in 1985.
　　Our direct photo emulsion and direct-indirect photo films (MS-film) feature in higher sensitivity, resolution power and definition and therefore are used in variety of applications like tip devices, LTD or PDP displays and contributing to endless progress of electric industry.
　　Not only those photo sensitive chemicals, Murakami group keep on studying and marketing about all screen related chemicals, supplies, and equipment to introduce you higher quality and higher productivity products together with the latest technique and information.
　　As a professional factory and a trading firm, Murakami Co.,Ltd. Is challenging the future of screen printing through our development capability, accumulated knowledge and our net-work.